An Innovative Interconnect Structure with Improved Elmore Delay Estimation Model for Deep Submicron Technology

Abstract

With advancements in technology, size and speed have been the important facet in VLSI interconnects. The channel length of the device reduces to tens of nanometers, as the technology is transferring to the deep submicron level. This leads to the requirement of long interconnects in VLSI chips. Interconnects are known as the basic building block that can vary from size to size. They provide a connection between two or more blocks and have scaling problems that an IC designer faces while designing. As scaling increases, the impact of interconnect in the VLSI circuits became even more important. It controls all the important electrical characteristics on the chip. With scale-down technology, interconnects not only become closer with each other but their dimensions also change which can directly impact the circuit parameters. Certain RC models have already been defined to control these parameters but in this paper, authors have proposed a new improved Elmore delay estimation model (RC) to reduce delay and power consumption in interconnect circuits. An optimized Elmore delay calculation was performed for uniform and non-uniform wires to reduce the time constant of the interconnect circuits. Further, the proposed model is estimated and verified theoretically. A new improved RC model is compared to the designed p-model that shows remarkable results. We also observed the linear relationship of power consumption and delay for both the RC models and found that in p-model, upon decreasing the length of wire the power first increases then decreases but in the proposed model, the power first increases then remain constant and then further increases upon increasing the length of wire. Our proposed model shows the remarkable values as the average percentage improvement of power is 75.167% and delay as 74.714% is achieved using a uniform distribution.